Applied Nanotools provides calibration standards for X-Ray, EUV and visible light microscopy for the highest resolution applications. These high quality optics include various calibration elements can be seen in the SEM images below:
||The ANT calibration standard was designed for the highest resolution requirements of X-Ray imaging systems with nanoscale features. Available for soft and hard X-Ray regimes and optical setups.
| Device List
| Ultra-High Resolution Soft X-Ray Calibration Standard (70 nm Au)
(15 nm half pitch)
| Soft X-Ray Calibration Standard (150 nm Au)
(25 nm half pitch or better)
| Hard X-Ray Calibration Standard (>600 nm Au)
(40 nm half-pitch or better)
• Nested L’s
• Siemen star patterns (large and small)
• Varying pitch gratings and meshe
• Nano USAF 1951
| • Custom Logo (Max 50 µm2 area)
| • Low stress 50 nm silicon nitride membrane
| • Low stress 200 nm silicon carbide membrane
| • Fused Silica Substrate (~500 um thick)
Chrome metal on glass (positive tone-only) >60 nm thickness
Negative polarity (features transparent)
• 30 nm minimum feature size (soft X-ray)
• 50 nm minimum feature size (hard X-ray)
| • Custom chip sizes
Custom Membranes / Substrates
Substrates for different application silicon membranes, silicon nitride membranes, fused silica and many other types of substrates. Calibration standards with features down to 20 nm can be provided.
Calibration standards are fabricated on standard 5 mm x 5 mm frames on a robust, low-stress silicon nitride membrane.
Fused quartz substrates can be used for optical microscopy with chrome features.
Custom designs can be added with facility logo with high resolution features (minimum element size of 50 nm recommended). Graphics must be provided in either a GDSII, EPS or vector format for best resolution. Contact us if you need help with the logo submission.
High resolution ANT logo with 20 nm features plated to 200 nm
Note: final design may not be exactly as shown.